发明名称 レーザリフトオフ装置
摘要 PROBLEM TO BE SOLVED: To prevent workpieces from being poorly lift-off processed or from being damaged even when lift-off processing is applied to small workpieces such as chip-like workpieces.SOLUTION: A support substrate S2 laminated with individual chip-like workpieces W comprised of a sapphire substrate S1 and a material layer M is mounted on a work stage 4. Laser light from a laser source 1 passes through a mask 21 and is irradiated onto the individual workpieces by a projection lens 2. The sapphire substrate S1 flying out from the chip-like workpieces during lift-off is saved from an optical path by saving means 7. The saving means 7 forms an airflow F on the optical path between the projection lens 2 and the work stage 4 and in a direction crossing the optical path. The sapphire substrate S1 is swept away by the airflow.
申请公布号 JP6008210(B2) 申请公布日期 2016.10.19
申请号 JP20140079351 申请日期 2014.04.08
申请人 ウシオ電機株式会社 发明人 鳴海 恵司
分类号 B23K26/14;B23K26/08;B23K26/36;B23K26/402;B23K26/57 主分类号 B23K26/14
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