发明名称 MANUFACTURING METHOD OF MICROSTRUCTURE AND MICROMACHINE
摘要 Without sacrificial layer etching, a microstructure and a micromachine are manufactured. A separation layer 102 is formed over a substrate 101, and a layer 103 to be a movable electrode is formed over the separation layer 102. At an interface of the separation layer 102, the layer 103 to be a movable electrode is separated from the substrate. A layer 106 to be a fixed electrode is formed over another substrate 105. The layer 103 to be a movable electrode is fixed to the substrate 105 with the spacer layer 103 which is partially provided interposed therebetween, so that the layer 103 to be a movable electrode and a layer 106 to be a fixed electrode face each other.
申请公布号 EP2029475(B1) 申请公布日期 2016.10.12
申请号 EP20070743258 申请日期 2007.05.08
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAGUCHI, MAYUMI;IZUMI, KONAMI
分类号 B81C3/00 主分类号 B81C3/00
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