| 摘要 |
An EUV pellicle is proposed in which the pellicle frame is made of a material having a linear expansion coefficient of 10 x 10 -6 (1/K) or smaller, and as such this pellicle is recommendable for use in EUV exposure technology wherein temperature is raised and lowered repeatedly and hence the expansion and contraction of the pellicle frame would harm the pellicle membrane and the pellicle flatness. |
