TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD AND CLEANING METHOD

摘要

This treatment composition for chemical mechanical polishing is characterized by containing (A) at least one compound selected from the group consisting of compounds represented by general formula (1) or general formula (2), and (B) a water-soluble polymer having at least one functional group selected from the group consisting of a carboxyl group, a sulfo group and an amino group. (In general formula (1), R1 represents a functional group selected from the group consisting of hydrocarbon groups having 1-10 carbon atoms and organic groups having a heteroatom and 1-20 carbon atoms.) (In general formula (2), R2 represents an organic group having 1-20 carbon atoms.)