| 摘要 |
Provided are a method for manufacturing an implant device and the implant device, said implant device being capable of highly satisfying the following requirements: (A) being bondable to a bone even though a lateral load is applied; (B) showing an excellent bonding force to a bone immediately after implanting; (C) showing no considerable lowering in the bonding force to a bone during the early stage of implanting; (D) having a strong bonding force to a bone; and (E) being inexpensively manufacturable. The method for manufacturing an implant device comprises: a rough surface formation step for forming unevenness on a surface of a member body that is formed of a titanium-containing material; a hydroxyl group formation step for forming hydroxyl groups on the uneven surface of the member body; and a calcium modification step for, simultaneously with the hydroxyl group formation step or after the hydroxyl group formation step, modifying the surface of the member body with calcium. In the rough surface formation step, unevenness is formed on the surface of the member body by an acid etching treatment, said treatment comprising immersing the member body in an acidic aqueous solution, so as to give a surface roughness Ra of the member body of 2 μm or greater. |
