| 摘要 |
Provided is a wavefront measuring device 1 having a light source unit 2, a retaining unit 3, a light-receiving optical system 4, a wavefront measuring unit 5, and a wavefront data generating unit 6, the light source unit 2 being disposed on one side of a measurement axis 7, the wavefront measuring unit 5 being disposed on the other side of the measurement axis 7, the retaining unit 3 being disposed between the light source unit 2 and the wavefront measuring unit 5, the light-receiving optical system 4 being disposed between the retaining unit 3 and the wavefront measuring unit 5, the retaining unit 3 having an opening 9 that retains the optical system to be tested 10, and the wavefront measuring device radiating luminous flux L1 from the light source unit 2 to the optical system to be tested 10, measuring luminous flux L3 that has been transmitted through the optical system to be tested 10 at the wavefront measuring unit 5, and generating wavefront aberration data at a wavefront data generation unit 6 from the result measured at the wavefront measuring unit 5, wherein the vicinity of the opening 9 and the vicinity of the wavefront measuring unit 5 are made optically conjugate by the light-receiving optical system 4, and the measurement of luminous flux includes at least measurement in the state of the center of the opening 9 being shifted by a predetermined distance from the measurement axis 7. |
