发明名称 ケイ素含有膜形成組成物および不純物拡散層の形成方法
摘要 A composition for forming a silicon-containing film of one embodiment of the present invention contains (A) a siloxane polymer that has a ring structure in a side chain, (B) a polar low-molecular-weight compound and (C) a solvent. The siloxane polymer (A) has a constituent unit represented by formula (a-2). Examples of the polar low-molecular-weight compound (B) may include basic amines such as a secondary or tertiary alcohol amine and an alkyl amine. With respect to the solvent (C), any solvent is applicable as long as the solvent dissolves the siloxane polymer (A).
申请公布号 JP6001268(B2) 申请公布日期 2016.10.05
申请号 JP20120000833 申请日期 2012.01.05
申请人 東京応化工業株式会社 发明人 吉井 靖博;高橋 元樹;平井 隆昭
分类号 H01L21/225;H01L21/22;H01L31/18 主分类号 H01L21/225
代理机构 代理人
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