发明名称 SYSTEM AND METHOD FOR SUBSTRATE TRANSFER
摘要 PROBLEM TO BE SOLVED: To provide a substrate transfer system which can suppress a substrate damage when the substrate is loaded on a sample holder.SOLUTION: The substrate transfer system includes: a substrate transfer device having a substrate holding pad for holding the substrate, and moving the substrate in a state of being held by the holding pad; a substrate holding device which makes the substrate holding pad hold the substrate with either a first retention force or second retention force being smaller than the first retention force and causing the substrate to easily detach from the substrate holding pad by an external force applied to the substrate when the substrate transferred by the substrate transfer device is bought into contact with a support pin; and a control device which controls the operation of the substrate transfer device and the substrate holding device. The control device, after transferring the substrate held by the substrate holding pad hold with the first retention force to a first position apart from the support pin on the substrate loading surface, transfers the substrate, held by the substrate holding pad with the second retention force, to a second position in contact with the support pin.SELECTED DRAWING: Figure 1
申请公布号 JP2016174116(A) 申请公布日期 2016.09.29
申请号 JP20150054201 申请日期 2015.03.18
申请人 SHIMADZU CORP 发明人 TAKEDA NAOYA;SHINOHARA MAKOTO
分类号 H01L21/677;B65G49/06;B65G49/07;C23C14/50;C23C16/44 主分类号 H01L21/677
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