发明名称 INSPECTING METHOD AND APPARATUS FOR TREATING A SUBSTRATE
摘要 The present invention relates to an inspecting method and an apparatus for treating a substrate. According to an embodiment of the present invention, the apparatus comprises: a process chamber; a container disposed within the process chamber and having a processing space; a supporting unit disposed within the processing space and supporting a substrate; a liquid supplying unit including a nozzle for supplying liquid to the substrate in a spray type; and an inspecting unit for inspecting the liquid supplied to the substrate. The inspecting unit includes a photographing member, and a determining member which determines a spray state of the liquid by obtaining an image of a region spaced a predetermined distance apart from the end of the nozzle. The determining member extracts a liquid pixel, which is a pixel corresponding to the liquid, from the image and determines the spray state of the liquid by using the extracted liquid pixel.
申请公布号 KR20160112240(A) 申请公布日期 2016.09.28
申请号 KR20150037550 申请日期 2015.03.18
申请人 SEMES CO., LTD. 发明人 KIM, DUK SIK;KIM, HYUN JUN
分类号 H01L21/66;H01L21/67 主分类号 H01L21/66
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