发明名称 半導体装置の製造方法、及び、半導体装置
摘要 A semiconductor device includes a third first-conductivity-type semiconductor layer on a semiconductor substrate; a first pillar-shaped semiconductor layer formed on the semiconductor substrate and including a first first-conductivity-type semiconductor layer, a first body region, a second first-conductivity-type semiconductor layer, a first second-conductivity-type semiconductor layer, a second body region, a second second-conductivity-type semiconductor layer, and a third second-conductivity-type semiconductor layer; a first gate insulating film around the first body region; a first gate around the first gate insulating film; a second gate insulating film around the second body region; a second gate around the second gate insulating film; an output terminal connected to the second first-conductivity-type semiconductor layer and the first second-conductivity-type semiconductor layer; and a first contact that connects the first gate and the second gate.
申请公布号 JP5990843(B2) 申请公布日期 2016.09.14
申请号 JP20150513918 申请日期 2014.07.14
申请人 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 发明人 舛岡 富士雄;中村 広記
分类号 H01L21/8238;H01L21/336;H01L27/092;H01L29/78 主分类号 H01L21/8238
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