| 摘要 |
Provided is a patterned roll, which eliminates the problem of side etching and which has excellent chemical resistance and release properties, and a manufacturing method therefor. The patterned roll is obtained by: coating a photosensitive material on the surface of a base material and exposing/developing to form a resist pattern; forming a first DLC coating film on the surface of the base material and the resist pattern; peeling off the first DLC coating film formed on the resist pattern together with the resist pattern to form a DLC pattern on the surface of the base material; and forming a second DLC coating film on the surface of the base material and the DLC pattern. |
