发明名称 光デバイスウエーハの研磨方法
摘要 PROBLEM TO BE SOLVED: To provide a method for polishing an optical device wafer, which can collectively replace a plurality of cracked fragments of an optical device wafer.SOLUTION: A method for polishing an optical device wafer includes a cracked wafer coping step comprising: an expanding tape sticking step of sticking an expanding tape which has a larger diameter than a diameter of the cracked optical device wafer, on a second face of the optical device wafer; a protective tape peeling step of peeling off a protective tape on a first face of the cracked optical device wafer; an expanding step of expanding the expanding tape, and separating the adjacent cracked fragments of the optical device wafer from each other; and a protective tape resticking step of sticking a protective tape on the first face of the cracked optical device wafer while such a state that the fragments are separated from each other is maintained.
申请公布号 JP5980055(B2) 申请公布日期 2016.08.31
申请号 JP20120192774 申请日期 2012.09.03
申请人 株式会社ディスコ 发明人 青木 昌史
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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