发明名称 処理液供給装置および処理液供給方法
摘要 PROBLEM TO BE SOLVED: To provide a processing liquid supply device and a processing liquid supply method capable of supplying clean processing liquid to a processing section immediately after restarting the processing liquid supply device.SOLUTION: First and second chemical liquid valves 15 and 16 and a filter drainage valve 31 are kept in a closed state after a chemical liquid supply unit is restarted. Then the first chemical liquid valve 15 is opened in a state where a pump 14 is driven. After a lapse of a predetermined time period after the first chemical liquid valve 15 is opened, the filter drainage valve 31 is opened. Then the filter drainage valve 31 is closed while the second chemical liquid valve 16 is being opened.
申请公布号 JP5977058(B2) 申请公布日期 2016.08.24
申请号 JP20120074135 申请日期 2012.03.28
申请人 株式会社SCREENホールディングス 发明人 安田 周一
分类号 H01L21/304;B08B3/04 主分类号 H01L21/304
代理机构 代理人
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