发明名称 Photoconducting layered material arrangement, method of fabricating the photoconducting layered material arrangement, and use of photoconducting layered material arrangement
摘要 A photoconducting layered material arrangement for producing or detecting high frequency radiation includes a semiconductor material including an alloy comprised of InGaAs, InGaAsSb, or GaSb, with an admixture of Al, which material is applied to a suitable support substrate in a manner such that the lattices are suitably adjusted, wherewith the semiconductor material comprised of InGaAlAs, InGaAlAsSb, or GaAlSb has a band gap of more than 1 eV, as a consequence of the admixed proportion of Al. The proportion x of Al in the semiconductor material InyGa1−y−xAlxAs is between x=0.2 and x=0.35, wherewith the proportion y of In may be between 0.5 and 0.55. The support substrate is InP or GaAs.
申请公布号 US2016240707(A1) 申请公布日期 2016.08.18
申请号 US201615042483 申请日期 2016.02.12
申请人 Technische Universität Darmstadt 发明人 Preu Sascha;Gossard Arthur C.;Palmstrom Christopher J.;Lu Hong
分类号 H01L31/0304;H01L31/18;H01L31/109 主分类号 H01L31/0304
代理机构 代理人
主权项 1. A photoconducting layered material arrangement for producing or detecting high frequency radiation, wherein a semiconductor material comprised of an alloy comprised of InGaAs, InGaAsSb, or GaSb, with an admixture of Al, is disposed on a suitable support substrate, wherewith the semiconductor material comprised of InGaAlAs, InGaAlAsSb, or GaAlSb has a band gap of more than 1 eV, as a consequence of the admixed proportion of Al.
地址 Darmstadt DE