| 摘要 |
The present invention provides a nanoparticle manufacturing system differing from convcntional nanoparticle fabricating equipment. In this nanoparticle manufacturing system, a laser beam emitted from a laser source is directly guided to the surface of a target disposed in an ablation chamber through a light guide tube, such that the laser beam is prevented from being influenced by reflection and/or refraction effects occurring from the cooling liquid filled in the ablation chamber. Moreover, in this nanoparticle manufacturing system, a light guidance-out end of the light guide tube is controlled to be apart from the target surface by a specific distance (<5mm). Thus, the laser beam is able to effectively process the target to a plurality of nanoparticles by way of laser ablation, in spite of the laser beam provided by the laser source is a low-power laser beam (< 30 mJ/pulse). |
