发明名称 Diode laser and method for producing a diode laser with high efficiency
摘要 The method involves forming a Bragg-grating within an aluminum-bearing layer (1), and structuring an aluminum-free mask layer (3) by etching in such a manner that the layer corresponds to a structure of a lacquered mask (4), which partially exposes an aluminum-free layer (2). The aluminum-bearing layer is completely covered by the aluminum-free layer. The aluminum-free layer within a reactor is structured by casting the mask layer by a gaseous etching medium in such a manner that the aluminum-free layer has a grid structure. Another aluminum-bearing layer (5) is attached within the reactor. An independent claim is also included for a diode laser comprising a cladding layer.
申请公布号 EP2595259(A3) 申请公布日期 2016.08.17
申请号 EP20120191454 申请日期 2012.11.06
申请人 FORSCHUNGSVERBUND BERLIN E.V. 发明人 BROX, OLAF;BUGGE, FRANK;CRUMP, PAUL;ERBERT, GÖTZ;MAASSDORF, ANDRE;SCHULTZ, CHRISTOPH M.;WENZEL, HANS;WEYERS, MARKUS
分类号 H01S5/12;H01L33/00;H01L33/10;H01S5/323 主分类号 H01S5/12
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