ION BEAM SOURCE

摘要

An ion beam source comprises: an anode; and a cathode arranging a first cathode and a second cathode in an upper side of the anode to be spaced at a first gap for forming a discharge space wherein the first cathode and the second cathode are spaced at a second gap from each other for extracting ion beam formed in the discharge space. Each of the first cathode and the second cathode includes first slops positioned at corners where the bottom surface facing the anode for enlarging the discharge space meets a side surface of the first cathode and a side surface of the second cathode facing each other. Therefore, the present invention enlarges the discharge source thereof to increase the amount of the extracted ion beam.