发明名称 NON-PLANAR SEMICONDUCTOR DEVICES HAVING MULTI-LAYERED COMPLIANT SUBSTRATES
摘要 Non-planar semiconductor devices having multi-layered compliant substrates and methods of fabricating such non-planar semiconductor devices are described. For example, a semiconductor device includes a semiconductor fin disposed above a semiconductor substrate. The semiconductor fin has a lower portion composed of a first semiconductor material with a first lattice constant (L1), and has an upper portion composed of a second semiconductor material with a second lattice constant (L2). A cladding layer is disposed on the upper portion, but not on the lower portion, of the semiconductor fin. The cladding layer is composed of a third semiconductor material with a third lattice constant (L3), wherein L3>L2>L1. A gate stack is disposed on a channel region of the cladding layer. Source/drain regions are disposed on either side of the channel region.
申请公布号 EP3050089(A1) 申请公布日期 2016.08.03
申请号 EP20130894260 申请日期 2013.09.27
申请人 INTEL CORPORATION 发明人 KAVALIEROS, JACK T.;RADOSAVLJEVIC, MARKO;METZ, MATTHEW V.;THEN, HAN WUI;CHU-KUNG, BENJAMIN;LE, VAN H.;MUKHERJEE, NILOY;DASGUPTA, SANSAPTAK;PILLARISETTY, RAVI;DEWEY, GILBERT;CHAU, ROBERT S.;ZELICK, NANCY M.;RACHMADY, WILLY
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址