| 摘要 |
PROBLEM TO BE SOLVED: To supply process liquid sufficiently at the interface of a substrate and a contact member with the substrate, in buff processing.SOLUTION: A buff processing unit performing buff processing of a substrate includes a buff table configured rotatably while supporting a substrate, a first buff head to which a first buff pad can be attached, and configured rotatably, and movably in a direction away from the buff table, with an inner supply line supplying process liquid for buff processing to the substrate being formed in the first buff head, and a second buff head to which a second buff pad can be attached, arranged to surround the first buff head on the outside thereof, and configured rotatably and movably in a direction approaching the buff table and a direction receding therefrom.SELECTED DRAWING: Figure 9 |
