发明名称 VAPOR DEPOSITION MASK AND MANUFACTURING METHOD THEREFOR
摘要 Provided are: a vapor deposition mask, with which a luminous layer with a uniform height can be formed with high precision and good reproducibility; and a manufacturing method therefor. A vapor deposition pattern 6 obtained from multiple independent vapor deposition through holes 5 is provided on a mask body 2. In the vapor deposition through holes 5, small hole parts 5a, which are located on the side of the substrate 30 to be coated, are formed so as to be in communication with large hole parts 5b, which are located on the vaporization source-side and are formed to be larger than the shape of the opening of the small hole parts 5a. As a result, the vapor deposition through holes 5 have a form that widens toward vaporization source, making it possible for the holes to accept organic material from the vaporization source at a wide angle and making it possible to form a luminous layer with a uniform height with good precision.
申请公布号 WO2016104207(A1) 申请公布日期 2016.06.30
申请号 WO2015JP84885 申请日期 2015.12.14
申请人 HITACHI MAXELL,LTD. 发明人 KOBAYASHI YOSHIHIRO;TAMARU HIROHITO;NAKASHIMA TAKASHI
分类号 C23C14/24;C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/24
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