| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology which inhibits unintentional substrate processing from being conducted after predetermined substrate processing is completed.SOLUTION: A substrate processing apparatus includes: a substrate support part which supports a substrate in a processing chamber; a process gas supply part which supplies a process gas to the processing chamber; and a moving mechanism which moves the substrate support part between a first position, at which the process gas supplied from the process gas supply part is blown onto the substrate, and a second position, at which the process gas supplied from the process gas supply part is not blown onto the substrate, in the processing chamber.SELECTED DRAWING: Figure 1 |
