| 摘要 |
The purpose of the present invention is to provide a method for manufacturing a photomask, which is capable of forming a transfer pattern having a high dimension precision. The method for manufacturing a photomask, which has a transfer pattern obtained by patterning an optical film on a transparent substrate, comprises; a photomask substrate preparing process; a drawing process; a resist pattern forming process; and an optical film patterning process. In the drawing process, the drawing is performed by using pattern data including transfer pattern data for forming the transfer pattern and monitor pattern data for forming a monitor pattern. The optical film patterning process comprises: a process of performing a first etching to etch the optical film for a predetermined time; a process of measuring dimensions of the monitor pattern; and a process of performing a second etching to additionally etch the optical film based on the dimensions of the monitor pattern obtained by the process of measuring the dimensions. |
