发明名称 ION IMPLANT SYSTEM HAVING GRID ASSEMBLY
摘要 An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to allow the ions to pass therethrough subsequent to the ions passing through the first grid plate, wherein the second grid plate is configured to be biased by a power supply; and a substrate holder configured to support a substrate in a position where the substrate is implanted with the ions subsequent to the ions passing through the second grid plate.
申请公布号 US2016181465(A1) 申请公布日期 2016.06.23
申请号 US201615054049 申请日期 2016.02.25
申请人 Intevac, Inc. 发明人 Adibi Babak;Chun Moon
分类号 H01L31/18;H01J37/32;H01L31/068 主分类号 H01L31/18
代理机构 代理人
主权项 1. A solar cell implantation system for fabricating interdigitated solar cells, comprising: an implant chamber, comprising: a plasma region and a plasma source configured to provide plasma in the plasma region, an implant region for simultaneously implanting plurality of solar cells with ions from the plasma region, and a grid assembly separating the plasma region and the implant region and comprising a plurality of apertures configured to allow ions from the plasma region to pass therethrough to the implant region; a multi-stage differentially pumped system comprising a plurality of increased vacuum stages leading to the implant region, and a plurality of reduced vacuum stages leading away from the implant region; and, a conveyor system for transporting the plurality of solar cells with physical masks through the multi-stage differentially pumped system, and for positioning the solar cells with the physical masks underneath the grid assembly to be simultaneously implanted at the implant stage through the masks.
地址 Santa Clara CA US