发明名称 Apparatus For Improving Temperature Uniformity Of A Workpiece
摘要 An apparatus and method for improving the temperature uniformity of a workpiece during processing is disclosed. The apparatus includes a ring heater assembly disposed along the outer circumference of the platen. The ring heater assembly includes heating elements disposed therein or thereon, where these heating elements create heat, which serves to warm the outer edge of the workpiece. In some embodiments, the ring heater assembly extends beyond the edge of the workpiece and may be exposed to the ion beam.
申请公布号 US2016181132(A1) 申请公布日期 2016.06.23
申请号 US201414575651 申请日期 2014.12.18
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Anella Steven M.;Schrameyer Michael A.
分类号 H01L21/67;H01L21/324;H01L21/683;H05B3/00 主分类号 H01L21/67
代理机构 代理人
主权项 1. A workpiece holding and heating apparatus, comprising: a platen; and a ring heater assembly surrounding an outer circumference of the platen, the ring heater assembly comprising a protective shield on a top surface and a heating element disposed beneath the protective shield.
地址 Gloucester MA US