发明名称 |
TUNNEL FIELD EFFECT TRANSISTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a tunnel field effect transistor capable of obtaining a heavier drain current through low voltage operation by applying a stronger electric field to a tunnel junction under a determined gate voltage.SOLUTION: The tunnel field effect transistor of the present invention comprises: a semiconductor region formed from a source region, a channel region which is disposed adjacently to the source region and of which the boundary surface is defined as a tunnel junction surface, and a drain region which is disposed adjacently to the channel region; and a gate electrode that is disposed on the semiconductor region via a gate insulation film. The gate electrode is disposed on each of a first gate electrode arrangement position which is located on a surface in the channel region opposite to the tunnel junction surface, and a second gate electrode arrangement position which is located on a bent surface in the channel region that is bent from an end of the opposite surface to the source region, and located in a bending direction of the opposite surface with the first gate electrode arrangement position as a reference.SELECTED DRAWING: Figure 1(a) |
申请公布号 |
JP2016115686(A) |
申请公布日期 |
2016.06.23 |
申请号 |
JP20130076015 |
申请日期 |
2013.04.01 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY |
发明人 |
MORITA YUKINORI;MIGITA SHINJI;OTA HIROYUKI |
分类号 |
H01L29/786;H01L21/336;H01L29/66;H01L29/78 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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