PATTERN FORMATION METHOD, COMPOSITION FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

摘要

A pattern formation method including: (a) a step for applying a coating of an actinic ray-sensitive or a radiation-sensitive resin composition onto a substrate, and forming an actinic ray-sensitive or a radiation-sensitive film; (b) a step for applying a coating of a composition for protective film formation onto the actinic ray-sensitive or radiation-sensitive film, and forming a protective film; (c) a step for causing the actinic ray-sensitive or radiation-sensitive film coated with the protective film to be exposed to light; and (d) a step for developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer containing an organic solvent. The protective film contains a resin (X) having a proton acceptor functional group.