发明名称 オフセット印刷用凹版洗浄液組成物及びこれを用いた洗浄方法
摘要 The present invention relates to an intaglio washing solution composition used for offset printing and a washing method using the composition. The present invention aims at providing the intaglio washing solution composition used for offset printing capable of quickly and reliably removing printing ink remained on an intaglio after printing. Especially, the intaglio washing solution composition used for offset printing comprises 1-25 parts of organic amine compound by mass, 10-70 parts of aromatic alcohol by mass, and 20-80 parts of organic solvent by mass without preservative and fluorine compound, thus the solid printing ink remained on the intaglio after printing can be uniformly and quickly removed without damaging the intaglio provided with a fine pattern, i.e., both BM printing ink and RGB printing ink are uniformly and quickly removed at the same time, thereby ensuring reproducibility of printed pattern, in addition, by directly introducing and continuously performing washing processes in an offset printing process, yield and productivity of the process can be raised.
申请公布号 JP5937854(B2) 申请公布日期 2016.06.22
申请号 JP20120055948 申请日期 2012.03.13
申请人 東友ファインケム株式会社DONGWOO FINE−CHEM CO., LTD. 发明人 サン シク キム;キュン ジュン コウ;ジョン ヒュン キム;ユ ジン リ
分类号 C11D7/32;C11D7/26;C11D7/50 主分类号 C11D7/32
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