| 摘要 |
The present invention presents an apparatus for rapid thermal treatment of a substrate having vertically aligned heat sources, which can resolve a temperature deviation according to a difference in a heat absorption rate, properly correct radiant energy varied depending on the position of the apparatus, and optimize heat efficiency of heat transmitted to the substrate. The apparatus includes a chamber having an inner partition wall and an outer partition wall. A heat circulation unit for circulating heat by heat exhaust is formed between the inner partition wall and the outer partition wall, and the inner partition wall has a heat source unit mounted thereto, a heat treatment space, in which a plurality of substrates mounted to be vertical to the inner partition wall are received, is ensured inside the chamber. The heat source unit includes: a heating lamp for radiating infrared rays; a reflection plate including a plurality of through-holes, the reflection plate being formed on the rear surface of the heating lamp to have an arch shape; and a nozzle for supplying control gas, the nozzle being located between the heating lamp and the reflection plate. |
