| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that produces a resist pattern with an excellent focus margin, and to provide a resin etc. useful for the resist composition.SOLUTION: The following (1) and (2) are provided: (1) a resin having a structural unit represented by formula (aa) and a compound which induces the structural unit; and (2) a resist composition containing the resin, an acid generator, and a solvent. In formula (aa), Trepresents a 4-34C sultone ring group which may have a substituent, Rrepresents a hydrogen atom or a 1-6C alkyl group, and Zrepresents *-X-CO-, provided that Xrepresents a 1-6C aliphatic hydrocarbon group. |
