| 摘要 |
The method involves arranging substrate on a substrate holder in a vacuum chamber (6). The reactive gas is fed into the vacuum chamber for removing carbon in the form of gas. A plasma discharge process is performed in the vacuum chamber to support the chemical reaction for stripping of the carbon on coated substrate. The plasma discharge is produced as a low voltage direct current arc discharge with the discharge currents of 20-1000 A or 50-300 A and discharge voltage of 120 V or 20-80 V. The reactive gas is hydrogen, oxygen or nitrogen gas. |
