发明名称 |
NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
To realize a nitride semiconductor light-emitting element having excellent lifespan characteristics in addition to improved light emission efficiency compared with conventional elements. A nitride semiconductor light-emitting element having a light-emitting layer obtained by alternately stacking a well layer comprising a nitride semiconductor and a barrier layer comprising a nitride semiconductor between an n-type nitride semiconductor layer and a p-type nitride semiconductor layer, wherein a final barrier layer, which is the barrier layer formed at a position in contact with the p-type nitride semiconductor layer, contains n-type impurities, and the concentration of n-type impurities at the interface with the p-type nitride semiconductor layer is 4×1017/cm3 or less. |
申请公布号 |
US2016163928(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
US201414906704 |
申请日期 |
2014.06.16 |
申请人 |
USHIO DENKI KABUSHIKI KAISHA |
发明人 |
TSUKIHARA Massashi;MIYOSHI Kohei |
分类号 |
H01L33/32;H01L33/00 |
主分类号 |
H01L33/32 |
代理机构 |
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代理人 |
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主权项 |
1. A nitride semiconductor light-emitting element comprising:
an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and a light-emitting layer formed between the n-type nitride semiconductor layer and the p-type nitride semiconductor layer, the light-emitting layer being obtained by alternately stacking at least one well layer comprising a nitride semiconductor and at least one barrier layer comprising a nitride semiconductor, wherein a final barrier layer among the barrier layer(s), which is a barrier layer formed at a position in contact with the p-type nitride semiconductor layer, contains n-type impurities, and the concentration of the n-type impurities at an interface with the p-type nitride semiconductor layer is 4×1017/cm3 or less. |
地址 |
Tokyo JP |