发明名称 NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 To realize a nitride semiconductor light-emitting element having excellent lifespan characteristics in addition to improved light emission efficiency compared with conventional elements. A nitride semiconductor light-emitting element having a light-emitting layer obtained by alternately stacking a well layer comprising a nitride semiconductor and a barrier layer comprising a nitride semiconductor between an n-type nitride semiconductor layer and a p-type nitride semiconductor layer, wherein a final barrier layer, which is the barrier layer formed at a position in contact with the p-type nitride semiconductor layer, contains n-type impurities, and the concentration of n-type impurities at the interface with the p-type nitride semiconductor layer is 4×1017/cm3 or less.
申请公布号 US2016163928(A1) 申请公布日期 2016.06.09
申请号 US201414906704 申请日期 2014.06.16
申请人 USHIO DENKI KABUSHIKI KAISHA 发明人 TSUKIHARA Massashi;MIYOSHI Kohei
分类号 H01L33/32;H01L33/00 主分类号 H01L33/32
代理机构 代理人
主权项 1. A nitride semiconductor light-emitting element comprising: an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and a light-emitting layer formed between the n-type nitride semiconductor layer and the p-type nitride semiconductor layer, the light-emitting layer being obtained by alternately stacking at least one well layer comprising a nitride semiconductor and at least one barrier layer comprising a nitride semiconductor, wherein a final barrier layer among the barrier layer(s), which is a barrier layer formed at a position in contact with the p-type nitride semiconductor layer, contains n-type impurities, and the concentration of the n-type impurities at an interface with the p-type nitride semiconductor layer is 4×1017/cm3 or less.
地址 Tokyo JP