| 摘要 |
PURPOSE:To obtain the photosetting resin compsn. having a high sensitivity with the simple method by using a photoinitiator which forms radical active species by exposing as a reaction initiator exposing by visible light under a nitrogen Atmosphere and developing in atom. CONSTITUTION:The photoinitiator which forms the radical active species by exposing is used as the reaction initiator and the compsn. is exposed by visible light in a nitrogen atmosphere and is developed in the atm. This method makes reverse use of the drawback that the reaction initiator is quenched by an oxygen atom even when made into a radical by sensitization. The reaction initiator is held shut off from O2 and, therefore, if the compsn. is exposed in the nitrogen atmosphere in which the quenching does not arise, the same state as the state of pinching the same with a transparent film is attained and the exposing with a high sensitivity can be executed. The photosetting resin compsn. having the high sensitivity is obtd. by the simple method of merely changing the atmosphere gas. |
