Method of manufacturing a photonic waveguide beam in a photonic integrated circuit.

摘要

Method of manufacturing a photonic waveguide in a photonic integrated circuit comprising the steps of: - providing a silicon wafer substrate; - oxidizing a surface of the silicon wafer substrate to form a silicon dioxide bottom cladding layer; - depositing a silicon nitride layer on top of the silicon dioxide bottom cladding layer; - providing and etching a photoresist layer on the silicon nitride layer to form a waveguide core; - providing a top cladding layer of silicon dioxide to bury the waveguide core; and - etching the top and bottom cladding layer of silicon dioxide adjacent to the buried waveguide core and etching the silicon layer adjacent and beneath the buried waveguide core so as to provide a suspended cantilever waveguide beam with a silicon nitride core surrounded by silicon dioxide; - wherein in the step of etching the top and bottom cladding layer notches are etched along the beam at preselected positions corresponding to a predefined desired length of the suspended cantilever waveguide beam.