| 摘要 |
A radiation-sensitive resin composition is provided containing a first polymer having a first structural unit represented by the following formula (1), and a radiation-sensitive acid generator. In the following formula (1), Z 1 to Z 4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, or a monovalent group that contains a hetero atom having a valency of no less than 2; R 3 represents a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, wherein at least any one of Z 1 , Z 2 and R 3 contains a fluorine atom, and wherein at least any one of Z 1 to Z 4 , the ring structure (a) and the ring structure (b) contains a hetero atom having a valency of no less than 2. |
