| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method suppressing a resin pattern from being formed in an unintended shape and advantageous in productivity improvement.SOLUTION: In the imprint method, when a resin on a substrate is molded by a mold, and cured with a light irradiation to form a pattern on the substrate, the mold is brought into contact with the resin in an atmosphere including butane-based gas. |
