发明名称 SPOT ARRAY SUBSTRATE, METHOD FOR PRODUCING SAME, AND NUCLEIC ACID POLYMER ANALYSIS METHOD AND DEVICE
摘要 In the present invention, in order to reduce the cost of manufacturing a spot array substrate and reduce the cost of nucleic acid polymer analysis, used is a spot array substrate which is manufactured by: preparing a resin substrate 402 having a surface on which an uneven pattern is formed, a plurality of bead seating positions being set in the shape of a two-dimensional array within the uneven pattern; and loading surface modification beads onto the bead seating positions of the resin substrate.
申请公布号 WO2016084489(A1) 申请公布日期 2016.06.02
申请号 WO2015JP78479 申请日期 2015.10.07
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ITABASHI NAOSHI;MIGITAKA SONOKO;NARAHARA MASATOSHI;SHOJI TOMOHIRO;ONO YUKIO
分类号 C12N15/09;C12M1/00;C12Q1/68;G01N35/02;G01N37/00 主分类号 C12N15/09
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