发明名称 RELEASE FILM FOR ANTISTATIC SURFACE PROTECTIVE FILM AND ANTISTATIC SURFACE PROTECTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a release film for an antistatic surface protective film that can produce an antistatic surface protective film not only causing little contamination on an adherend but also retaining low contamination on an adherend unchanged with the lapse of time and having excellent peeling antistatic performance without causing deterioration with the lapse of time and to provide an antistatic surface protective film.SOLUTION: A release film 5 for an antistatic surface protective film capable of transferring a silicone compound which is liquid at 20°C and an antistatic agent to a surface of a pressure-sensitive adhesive layer 2 of an antistatic surface protective film having the pressure-sensitive adhesive layer 2 on one side of a base material film 1 is produced by laminating a release agent layer 4 containing the antistatic agent on one side of a resin film 3. The release agent layer 4 is formed of a resin composition including a release agent composed mainly of dimethyl polysiloxane, a polyether-modified silicone as the silicone compound which is liquid at 20°C and an ionic compound having a melting point of 30 to 80°C as the antistatic agent.SELECTED DRAWING: Figure 1
申请公布号 JP2016101754(A) 申请公布日期 2016.06.02
申请号 JP20150249017 申请日期 2015.12.21
申请人 FUJIMORI KOGYO CO LTD 发明人 KOBAYASHI HIROYUKI;KASUGA MITSURU;ENDO YOSHIKO;HAYASHI MASUFUMI
分类号 B32B27/00;B32B27/18;G02B5/30 主分类号 B32B27/00
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