发明名称 Device and process for positioning individual particles on a substrate
摘要 A device and process for positioning individual particles on a substrate is proposed. The device is equipped with at least one particle source which isolates particles of a defined material, with a focusing unit with an entry window facing the particle source and an exit window facing away from the particle source, with a substrate holder to hold the substrate, wherein the focusing unit guides the particles entering through its entry window into defined positions on the substrate, with at least one deflection unit arranged between the particle source and the focusing unit with an entry window facing the particle source and an exit window on the deflector unit facing away from the particle source, wherein the deflector unit preconditions the particles entering through its entry window before they reach the focusing unit.
申请公布号 US9352964(B2) 申请公布日期 2016.05.31
申请号 US201213418711 申请日期 2012.03.13
申请人 Mueller Markus Robert 发明人 Mueller Markus Robert
分类号 B82Y40/00;B82B3/00;B82Y30/00 主分类号 B82Y40/00
代理机构 Collard & Roe, P.C. 代理人 Collard & Roe, P.C.
主权项 1. Device for positioning individual particles on a substrate, the device comprising at least one particle source isolating particles of a defined material, a focusing unit with a focusing unit entry window facing the at least one particle source anda focusing unit exit window facing away from the at least one particle source, a substrate holder holding the substrate, wherein the substrate held by the substrate holder is arranged at the focusing unit exit window, and wherein the focusing unit guides the particles entering through the focusing unit entry window into defined positions on the substrate, at least one deflection unit arranged between the at least one particle source and the focusing unit with a deflection unit entry window facing the at least one particle source anda deflection unit exit window facing away from the at least one particle source, wherein the at least one deflection unit preconditions the particles entering through the deflection unit entry window before the particles reach the focusing unit, at least one measuring unit disposed in the at least one deflection unit and determining location and/or speed of the particles in the at least one deflection unit, and at least one controller controlling the at least one deflection unit in accordance with readings from the at least one measuring unit, wherein the at least one deflection unit comprises a first electrical component and a second electrical component, each of the first electrical component and the second electrical component generating respective electromagnetic fields and being disposed in the at least one deflection unit between the deflection unit entry window and the deflection unit exit window, and wherein the at least one measuring unit comprises a first sensor disposed downstream from the first electrical component and disposed upstream from the second electrical component.
地址 Zurich CH