发明名称 Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof
摘要 Embodiments of the invention relate to a substrate processing apparatus. In one embodiment, a substrate processing apparatus includes a plurality of process units. The process unit includes a process chamber for processing a substrate, an exhaust conduit connected to the process chamber and an exhaust pump arranged in the path of the exhaust conduit. The substrate processing apparatus further includes a connecting conduit connected to the exhaust conduits of the process units in the upstream of the exhaust pump and a switching unit which switches an exhaust path of the process chamber to the other exhaust pump in the other process unit via the connecting conduit.
申请公布号 US9353438(B2) 申请公布日期 2016.05.31
申请号 US201414494085 申请日期 2014.09.23
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 Sano Atsushi
分类号 C23C16/06;C23C16/44;C23C16/56;C23C16/46;C23C16/52;H01L21/32;H01L21/3205 主分类号 C23C16/06
代理机构 Volpe and Koenig, P.C. 代理人 Volpe and Koenig, P.C.
主权项 1. A substrate processing apparatus comprising: a plurality of process units, each process unit including: a process chamber for processing a substrate,an exhaust conduit connected to the process chamber andan exhaust pump arranged in a path of the exhaust conduit; a connecting conduit connected to the exhaust conduits of the process units upstream of the exhaust pumps of the process units; a switching unit which switches an exhaust path of the process chamber to another exhaust pump in another process unit via the connecting conduit; a controller controlling the operation of the switching unit; and a detector for detecting an abnormality of the exhaust pump, wherein the controller controls the switching unit so that the process chamber in the process unit that includes the exhaust pump having the detected abnormality is connected to the exhaust pump in the process chamber that is in an idle state.
地址 Tokyo JP
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