发明名称 MANUFACTURING METHOD OF MEMS STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an MEMS structure being capable of easily manufacturing the MEMS structure, excellent in productivity and having a high yield.SOLUTION: A manufacturing method of an MEMS structure includes: an outer shape formation step of forming grooves 105 in a substrate for element formation becoming elements; a filling step of filling the grooves 105 with sacrificial materials 106; a bonding step of bonding a support substrate to a surface of a groove 105 side of the substrate for element formation; a grinding step of grinding the substrate for element formation from a surface of an opposite side to the grooves 105 of the substrate for element formation at least until it reaches the grooves 105; and a sacrificial material removal step of removing the sacrificial material 106.SELECTED DRAWING: Figure 9
申请公布号 JP2016097454(A) 申请公布日期 2016.05.30
申请号 JP20140234262 申请日期 2014.11.19
申请人 SEIKO EPSON CORP 发明人 KAMISUKE SHINICHI
分类号 B81C3/00;G01P15/125;H01L29/84 主分类号 B81C3/00
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