| 摘要 |
The invention relates to a device for spatial exposure of profiled valves of complex shapes and maximally increased dimensions, which are subjected to titanium ion emission in a low-pressure chamber of a titanium-coating plant, the device exhibiting a unitary and modulated structure which is yielding and resilient, being interchangeable and adaptable to any titanizing plant with minimal cost, with application in the machine building industry. According to the invention, the device consists of a clockwise rotating plate (1) on which six small-sized anti-clockwise rotating trays (2) are equidistantly arranged to receive thereon the valves (4) to be subjected to multilayer titanizing, which have maximally increased dimensions up to a diameter Dp/2, the rotation of the profiled valves (4) being ensured by the bearings (6) and the gearings (7 and 8). |
