| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin and a resist composition from which a resist pattern can be produced with good CD (critical dimension) uniformity.SOLUTION: The resin is a resin (A1) comprising a structural unit represented by formula (a4) and a structural unit represented by formula (I); and the resist composition comprises the above resin (A1), a resin (A2) having an acid-labile group, and an acid generator. In the formulas, Rand Rrepresent a hydrogen atom or a methyl group; Rrepresents a saturated hydrocarbon group having a fluorine atom, in which a methylene group may be replaced by an oxygen atom or a carbonyl group; Rrepresents a hydrocarbon group having an alicyclic hydrocarbon group; and Arepresents an alkanediyl group, or the like.SELECTED DRAWING: None |
