NOVEL POLYMERS AND USE OF THESE AS DISPERSANTS

摘要

The present invention relates to novel polymers P and to their salts, to a process for their manufacturing, to the use of said polymers as dispersants for fine particulate solid material. The present invention further relates to liquid compositions containing solid fine particles, such as organic or inorganic pigments and fillers, and the novel polymers P and their salts as dispersants. The polymers P have at least one functional group of the formula (I) bound to one of the termini and/or to the backbone of the polymer: formula (I) where # indicates the point of attachment to the terminus and/or to the polymer backbone and the variables k, m, A, Q, R1, R2, X and Y are as defined in claim 1.;

主权项

1. A polymer P having at least one functional group of the formula I: bound to one of the termini and/or to the backbone of the polymer, where # indicates the point of attachment to the terminus and/or to the polymer backbone; k is 0, 1, 2, 3 or 4; m is 0, 1, 2, 3, 4, 5, 6, 7, 8 or 9; A is a chemical bond or a divalent moiety selected from the group consisting of C1-C6 alkylene, —O—(C2-C6 alkylene), —C(═O)—O—(C2-C6 alkylene), —NR3—(C2-C6 alkylene) and C(═O)—NR3—(C2-C6 alkylene), where the C2-C6 alkylene part is attached to Q; Q is a divalent moiety selected from the group consisting of —O—, —NH— and —S—; R1 is independently selected from the group consisting of —OH, —COOH, —COOCH3, —NH2, —NH(C1-C6 alkyl), —N(C1-C6 alkyl)2, —NO2, —S(═O)2R4, C1-C20 alkyl, C1-C4 alkoxy, halogen, aryloxy, aryl, heteroaryl, where aryl, hetaryl and aryloxy are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of —OH, —COOH, —COOCH3, —NH2, —NH(C1-C6 alkyl), —N(C1-C6 alkyl)2, —NO2, —S(═O)2R4, C1-C4 alkyl, C1-C4 alkoxy and halogen; R2 is selected from the group consisting of hydrogen, —S(═O)2R4, C1-C20 alkyl, C3-C10 cycloalkyl, aryl, heteroaryl, aryl-C1-C4-alkyl and heteroaryl-C1-C4-alkyl, where aryl and hetaryl in the four last mentioned radicals are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of —OH, —COOH, —COOCH3, —NH2, —NH(C1-C6 alkyl), —N(C1-C6 alkyl)2, —NO2, —S(═O)2R4, C1-C4 alkyl, C1-C4 alkoxy and halogen; X is a divalent moiety selected from the group consisting of linear C1-C10 alkylene, linear C2-C6 alkenylene, C4-C7 cycloalkylene, arylene and alkarylene, where the linear C1-C10 alkylene, linear C2-C6 alkenylene and C4-C7 cycloalkylene are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of C1-C18 alkyl or C1-C18 alkenyl, and where arylene and alkarylene are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of C1-C4 alkyl, C1-C4 haloalkyl, aryl, —COOH, —COOCH3, —NO2 or halogen; R3 is selected from the group consisting of hydrogen, —S(═O)2R4, C1-C20 alkyl, C3-C10 cycloalkyl, aryl and heteroaryl, where aryl and hetaryl are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of —OH, —COOH, —COOCH3, —NH2, —NH(C1-C6 alkyl), —N(C1-C6 alkyl)2, —NO2, —S(═O)2R4, C1-C4 alkyl, C1-C4 alkoxy and halogen; R4 is selected from the group consisting of OH, —NH2, —NH(C1-C6 alkyl), —N(C1-C6 alkyl)2, C1-C4 alkyl, C1-C4 alkoxy, aryl and heteroaryl, where aryl and hetaryl are unsubstituted or substituted by 1, 2, 3 or 4 radicals selected from the group consisting of C1-C4 alkyl, C1-C4 alkoxy and halogen; Y is selected from —OH or a moiety of the general formula I.2 where * indicates the point of attachment to the carbonyl group and #, k, m, A, Q, R1 and R2 are as defined above; and its salts.