发明名称 MANUFACTURING METHOD OF MICROLENS ARRAY SUBSTRATE, MICROLENS ARRAY SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent reduction in yield and quality of a microlens array substrate produced by laminating different inorganic materials.SOLUTION: A manufacturing method of a microlens array substrate, having a first area provided with recesses formed on a first surface of a substrate body and a second area provided with a flat surface formed on the first surface of the substrate body, includes the steps of: forming a silicon film over the second area of the first surface (S1, S2); forming a first oxide film to cover the silicon film (S3); forming a second oxide film between the silicon film and the first oxide film by heat-treating the silicon film in an atmosphere of gas containing oxygen, oxidizing the silicon film thereby (S4); and forming the recesses in the first area V1 of the first surface (S5, S6, S7).SELECTED DRAWING: Figure 5
申请公布号 JP2016095442(A) 申请公布日期 2016.05.26
申请号 JP20140232433 申请日期 2014.11.17
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI
分类号 G02B3/00;G02F1/1335;G09F9/00 主分类号 G02B3/00
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