| 摘要 |
The present invention provides a gas barrier film having high gas barrier properties and also having high durability even under harsh, high-temperature, high-humidity conditions. The gas barrier film includes a substrate and at least one gas barrier layer on the substrate, wherein the gas barrier layer includes at least one gas barrier layer A having a chemical composition of chemical formula (1): SiAlwOxNyCz, wherein w, x, y, and z are the elemental ratios of aluminum to silicon, oxygen to silicon, nitrogen to silicon, and carbon to silicon, respectively, measured in the thickness direction of the gas barrier layer, y is the maximum value of the elemental ratio of nitrogen to silicon measured in the thickness direction of the gas barrier layer and satisfies mathematical formula (1): 0.05≦y≦0.20, and w, x, and z satisfy mathematical formula (2): 0.07≦w≦0.20, mathematical formula (3): 1.90≦x≦2.40, and mathematical formula (4): 0.00≦z≦0.20, respectively, when measured at the point where the elemental ratio of nitrogen to silicon is the maximum value. |
| 主权项 |
1. A gas barrier film comprising:
a substrate; and at least one gas barrier layer on the substrate, wherein the gas barrier layer comprises at least one gas barrier layer A having a chemical composition of chemical formula (1),
[Chem. 1]SiAlwOxNyCz (1) wherein w, x, y, and z are elemental ratios of aluminum to silicon, oxygen to silicon, nitrogen to silicon, and carbon to silicon, respectively, measured in a thickness direction of the gas barrier layer, y is a maximum value of the elemental ratio of nitrogen to silicon measured in the thickness direction of the gas barrier layer and satisfies mathematical formula (1), and w, x, and z satisfy mathematical formulae (2) to (4)
[Math. 1]0.05≦y≦0.20 mathematical formula (1)0.07≦w≦0.20 mathematical formula (2)1.90≦x≦2.40 mathematical formula (3)0.00≦z≦0.20 mathematical formula (4) respectively, when measured at a point where the elemental ratio of nitrogen to silicon is the maximum value. |
