发明名称 X-RAY SOURCE
摘要 The present invention provides an X-ray source. The X-ray source includes a cathode having an emitter configured on an upper surface thereof; a gate electrode disposed on the cathode; a target formed to have a focal spot size; and an anode having the target to a lower surface thereof, having an oxide film formed on the surface of the periphery thereof to which the target is attached, and including aluminum. Thus, the manufacturing costs of the X-ray source may be reduced, and the manufacturing process thereof may be simplified.
申请公布号 KR20160058583(A) 申请公布日期 2016.05.25
申请号 KR20140160259 申请日期 2014.11.17
申请人 VATECH CO., LTD.;VATECH EWOO HOLDINGS CO., LTD. 发明人 YOU, SEUNG MIN;KIM, YOUNG KWANG
分类号 H01J35/04 主分类号 H01J35/04
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