发明名称 VACUUM CHUCK APPARATUS
摘要 The present invention relates to a vacuum chuck apparatus which: has a vacuum chuck composition unit formed to be able to stably mount an object for performing a work or an experience so that a suction pressure generated in a chamber can be generated evenly over the whole surface of an absorption unit; installs the vacuum chuck composition unit to keep the same working height; and has a frame to form a single apparatus by accommodating peripheral devices for driving the vacuum composition unit. For the above, a vacuum chuck of the present invention has a composition of combining the absorption unit, formed with a porous material to be supported as an object is absorbed, with a base generating an absorption pressure for the absorption unit by being combined with the absorption unit. The base includes: the vacuum chuck composition unit in which a chamber is formed to have a vacuum state inside, a plurality of support bars is formed to support the absorption unit toward the inside of the chamber, and an intake hole is formed to generate an intake pressure in the chamber in at least any one side of the base; and the frame in which the vacuum chuck composition unit is mounted in the upper part in order to enable the vacuum chuck composition unit to maintain a height for performing work and an accommodation space is formed to accommodate a facility to drive the vacuum chuck composition unit to the lower side of the vacuum chuck composition unit.
申请公布号 KR101623203(B1) 申请公布日期 2016.05.20
申请号 KR20150033702 申请日期 2015.03.11
申请人 PARK, U TAE 发明人 PARK, U TAE
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
主权项
地址