| 摘要 |
FIELD: machine building.SUBSTANCE: invention relates to an apparatus for continuous vacuum deposition of metal coating on moving substrate and method for preparing the continuous vacuum deposition of metal coating on moving substrate in said apparatus. Proposed plant comprises chamber (24) of vacuum deposition of at least one head (25, 26) for application of coating by jet steam deposition, connected with evaporation crucible (9) designed for holding the coating metal in liquid form (11), by pipeline (20) feeding steam, equipped with distribution valve (19), and furnace (1) for melting of said metal. Said furnace is under atmospheric pressure, it is located below the level of the lowest part of evaporation of the crucible (9) and is connected with evaporative crucible (9) at least one pipeline (8) for automatic supply of evaporative crucible (9), equipped with a feed pump (6), and at least one pipeline (8A, 18) for return of liquid metal, optionally equipped with valve (16, 17). Apparatus additionally includes the means for the supply pump (6) control providing control of certain level of liquid metal in the evaporation crucible (9). Apparatus comprises zones, so called thermal valves, in each of the said feeding pipelines (8, 8A, 18) and return pipelines (7, 13, 15), each zones is equipped with heating device and cooling device for obtaining controlled temperature, independent from the temperature of melting furnace (1) and from the temperature in the remaining part of the said pipelines (8, 8A, 18) and in the evaporation crucible (9), for melting or hardening of the metal present at this place.EFFECT: possibility of hardening liquid metal without formation of solid plug on free surface of furnace or in feeding pipelines.14 cl, 4 dwg |
