发明名称 RAW MATERIAL GAS SUPPLY APPARATUS, AND FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To stabilize a vaporization rate of a raw material and achieve a high vaporization efficiency, in supplying the raw material obtained by sublimation of a solid raw material to a consumption zone together with a carrier gas.SOLUTION: A solid raw material is put in a raw material vessel 3 and heated up to a sublimation temperature or higher by an infrared lamp 6. A carrier gas is supplied to the raw material vessel 3 and the sublimated gas is supplied with the carrier gas to a consumption zone, a deposition process unit 2. Since the solid raw material is directly heated by infrared radiation, temperature difference between a center region and a peripheral region in the raw material vessel 3 is suppressed. A vaporization rate of the raw material is thus stabilized and a high vaporization efficiency is achieved. The raw material gas obtained at a stable vaporization rate of the raw material is supplied to the deposition process unit 2 and thus gives a thin film of stable film quality in the deposition process unit 2.SELECTED DRAWING: Figure 1
申请公布号 JP2016084507(A) 申请公布日期 2016.05.19
申请号 JP20140217658 申请日期 2014.10.24
申请人 TOKYO ELECTRON LTD 发明人 MOROI MASAYUKI
分类号 C23C16/448;H01L21/285;H01L21/31 主分类号 C23C16/448
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