发明名称 |
METHOD FOR MANUFACTURING DISPLAY PANEL |
摘要 |
A method for manufacturing display panel is disclosed, which comprises: (A) providing a substrate, an oxide semiconductor layer disposed on the substrate, and a gate electrode disposed on the substrate and corresponding to the oxide semiconductor layer; (B) forming a metal layer on the oxide semiconductor layer; (C) forming a photoresist on the metal layer, and etching the metal layer to form a source electrode and a drain electrode; (D) heating the photoresist and the photoresist covers at least partial of side walls of the source electrode and the drain electrode; (E) applying an alkaline solution on the substrate; and (F) removing the photoresist to expose the source electrode and the drain electrode. |
申请公布号 |
US2016141390(A1) |
申请公布日期 |
2016.05.19 |
申请号 |
US201514923473 |
申请日期 |
2015.10.27 |
申请人 |
InnoLux Corporation |
发明人 |
KAO Ker-Yih;TING Chin-Lung;CHANG Jung-Fang;WANG Chien-Chung |
分类号 |
H01L29/66;H01L27/12;H01L29/417;H01L29/49 |
主分类号 |
H01L29/66 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for manufacturing a display panel, comprising:
(A) providing a substrate; an oxide semiconductor layer disposed on the substrate; and a gate electrode disposed on the substrate and corresponding to the oxide semiconductor layer; (B) forming a metal layer on the oxide semiconductor layer; (C) forming a photoresist on the metal layer, and etching at least partial of the metal layer to form a source electrode and a drain electrode; (D) heating the photoresist and the photoresist covers at least partial of side walls of the source electrode and the drain electrode; (E) applying an alkaline solution on the substrate; and (F) removing the photoresist to expose the source electrode and the drain electrode. |
地址 |
Miao-Li County TW |